SPIE Advanced Lithography + Patterning

  • 25-29 Feb 2024
  • San Jose, CA, United States

Description

SPIE Advanced Lithography + Patterning is a conference and exhibition that addresses the challenges presented in optical and EUV lithography, metrology, patterning technologies, and process integration for semiconductor manufacturing and covers topics such as:

  • DTCO and Computational Patterning
  • Optical and EUV Nanolithography
  • Novel Patterning Technologies
  • Metrology, Inspection, and Process Control
  • Advanced Etch Technology and Process Integration for Nanopatterning
  • Advances in Patterning Materials and Processes

SPIE Advanced Lithography + Patterning brings together the lithography community, including researchers and managers working in the lithography industry.

Venue

  • San Jose McEnery Convention Center , 150 West San Carlos St. , San Jose, California, United States
Booking.com

More Details

Prices:
500-1000 US Dollar (Estimated)
Exhibition:
Included
Organizer:
SPIE - The International Society for Optics and Photonics
Website:

Future Events

Past Events

Important

Please, check "SPIE Advanced Lithography + Patterning" official website for possible changes, before making any traveling arrangements

Event Categories

Industry: Electronics & Electrical, Printing
Science: Engineering
Technology: Optics

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